Contact optimisation strategy for wafer-scale field-effect transistors based on two-dimensional semiconductors-Reference-Cited by-同舟云学术

Contact optimisation strategy for wafer-scale field-effect transistors based on two-dimensional semiconductors

Published:2023-01 Issue: Volume:133 Page:230-237
ISSN:1005-0302
Container-title:Journal of Materials Science & Technology
language:en
Short-container-title:Journal of Materials Science & Technology

Author:

Tong Ling,Guo Xiaojiao,Shen Zhangfeng,Zhou Lihui,Ma Jingyi,Chen Xinyu,Chen Honglei,Xia Yin,Sheng Chuming,Gou Saifei,Wang Die,Wang Xinyu,Dong Xiangqi,Zhu Yuxuan,Zhang Xinzhi,Zhang David Wei,Dai Sheng,Li Xi,Zhou Peng,Wang Yangang,Bao Wenzhong

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Polymers and Plastics,Mechanical Engineering,Mechanics of Materials,Ceramics and Composites

Reference50 articles.

1. Promises and prospects of two-dimensional transistors

2. Two-dimensional materials for next-generation computing technologies

3. Graphene and two-dimensional materials for silicon technology

4. Electronics and optoelectronics of two-dimensional transition metal dichalcogenides

5. Few-Layer MoS2: A Promising Layered Semiconductor

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent progress in plasma modification of 2D metal chalcogenides for electronic devices and optoelectronic devices;Nanoscale;2024

2. Size-dependent SERS property of red phosphorous in the transition from bulk to nanosheet and its application in immunosensing;Surfaces and Interfaces;2024-01

3. Two‐Dimensional Semiconductors: From Device Processing to Circuit Integration;Advanced Functional Materials;2023-08-17

4. Di-Metal Chalcogenides: A New Family of Promising 2-D Semiconductors for High-Performance Transistors;IEEE Transactions on Electron Devices;2023-05

5. Tunable electrical contacts in two-dimensional silicon field-effect transistors: The significance of surface engineering;Applied Surface Science;2023-03