n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates-Reference-Cited by-同舟云学术

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n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates

Published:2015-01 Issue:1 Volume:31 Page:65-69
ISSN:1005-0302
Container-title:Journal of Materials Science & Technology
language:en
Short-container-title:Journal of Materials Science & Technology

Author:

Zhang Hongliang,Zhu Liqiang,Guo Liqiang,Liu Yanghui,Wan Qing

Funder

National Natural Science Foundation of China

Ningbo Natural Science Foundation

Zhejiang Province Preferential Post-doctor Funding Project

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Polymers and Plastics,Mechanical Engineering,Mechanics of Materials,Ceramics and Composites

Reference25 articles.

1. A review of thin-film crystalline silicon for solar cell applications. Part 2: Foreign substrates

2. Polycrystalline silicon thin films processed with silicon ion implantation and subsequent solid‐phase crystallization: Theory, experiments, and thin‐film transistor applications

3. Formation and stability of silicides on polycrystalline silicon

4. Thin-film polysilicon solar cells on foreign substrates using direct thermal CVD: material and solar cell design

5. Linear thermal expansion coefficients of amorphous and microcrystalline silicon films

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