Investigation on impact of AlxGa1-xN and InGaN back barriers and source-drain spacing on the DC/RF performance of Fe-doped recessed T-gated AlN/GaN HEMT on SiC wafer for future RF power applications
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Biomaterials
Reference43 articles.
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1. Effect of lateral inhomogeneous AlGaN barrier layer on electronic properties of GaN HEMTs;Micro and Nanostructures;2024-07
2. Improvement of single event transients effect for a novel AlGaN/GaN HEMT with enhanced breakdown voltage;Journal of Science: Advanced Materials and Devices;2024-06
3. Investigation of different buffer layer impact on AlN/GaN/AlGaN HEMT using silicon carbide substrate for high-speed RF applications;Micro and Nanostructures;2024-05
4. On the double channel engineering of dual gate AlGaN/GaN HEMTs for heavy ion sensing applications;Micro and Nanostructures;2023-10
5. Impact of barrier layer thickness on DC and RF performance of AlGaN/GaN high electron mobility transistors;Applied Physics A;2023-07-19
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