Determination of the semiconductor doping profile right up to its surface using the MIS capacitor
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Silicon Impurity Distribution as Revealed by Pulsed MOS C-V Measurements
2. Using the MIS capacitor for doping profile measurements with minimal interface state error
3. Correcting interface‐state errors in MOS doping profile determinations
4. Impurity Distribution in Epitaxial Silicon Films
Cited by 67 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. X-ray and electron spectroscopy of (photo)electrocatalysts: Understanding activity through electronic structure and adsorbate coverage;Journal of Vacuum Science & Technology A;2021-07
2. A Reliable Technology for Advanced SiC-MOS Devices Based on Fabrication of High Quality Silicon Oxide Layers by Converting a-Si;IEEE Journal of the Electron Devices Society;2019
3. Analysis and TCAD Simulation for C/V, and G/V Electrical Characteristics of Gated Controlled Diodes for the AGIPD of the EuXFEL;Si Detectors and Characterization for HEP and Photon Science Experiment;2019
4. Electrical Properties;Springer Handbook of Metrology and Testing;2011
5. Parameter extraction using novel phenomena in nano-MOSFETs with ultra-thin (EOT=0.46–1.93 nm) high-K gate dielectrics;Thin Solid Films;2006-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3