Author:
Windbracke W.,Betz H.,Huber H.-L.,Pilz W.,Pongratz S.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference4 articles.
1. Proximity Effekt correction in vector scan electrobeam lithography;Youngman;SPIE,1878
2. Submicron patterns formed by reactive ion etching;Pilz;Proceedings Microcircuit Eng.,1985
3. Synchrotron Lithography for sub-half-micron T-gates in GaAs FETs;Müller;Proceeding Microcircuit Engineering,1986
Cited by
12 articles.
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1. Lithography for micro-electronics;Radiation Physics and Chemistry;1995-03
2. Diamond membrane based x-ray masks;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-11
3. Pulse plating of quarter micron gold patterns on silicon X-ray masks;Microelectronic Engineering;1990-04
4. Procedure and results of mask fabrication via X-ray lithography;Microelectronic Engineering;1990-04
5. Applications of Plasma Etching;Plasma-Surface Interactions and Processing of Materials;1990