Performance optimization of the chemically amplified radiation resist RAY-PF-Reference-Cited by-同舟云学术

Performance optimization of the chemically amplified radiation resist RAY-PF

Published:1991-03 Issue:1-4 Volume:13 Page:73-78
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Ballhorn R.-U.,Dammel R.,David H.H.,Eckes Ch.,Fricke-Damm A.,Kreuer K.,Pawlowski G.,Przybilla K.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Negative-tone high-resolution photocatalytic resist for x-ray lithography

2. A study of catalytically transformed negative X-ray resists, based on aqueous base developable resin, an acid generator and a crosslinker

3. A study of the effect of key processing variables on the lithographic performance of Microposit SAL601-ER7 resist

4. Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication

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1. Resists for X-ray Lithography;Encyclopedia of Materials: Science and Technology;2001

2. High aspect ratio resist structures by E-beam overexposure;Microelectronic Engineering;1995-02

3. Modeling and simulations of a positive chemically amplified photoresist for x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11

4. Transfer of single-layer positive resist sub-micrometer and nanometer structures into silicon;Microelectronic Engineering;1994-05

5. Chemically amplified soft-x-ray resists: sensitivity, resolution, and molecular photodesorption;Applied Optics;1993-12-01