A study of the effect of key processing variables on the lithographic performance of Microposit SAL601-ER7 resist-Reference-Cited by-同舟云学术

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A study of the effect of key processing variables on the lithographic performance of Microposit SAL601-ER7 resist

Published:1988-11 Issue:6 Volume:6 Page:2280
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Blum Lauren

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Charged Particle and Photon-Induced Reactions in Polymers;Charged Particle and Photon Interactions with Matter;2003-11-14

2. Simultaneous exposure of filter gratings and waveguides by direct write electron-beam lithography;Microelectronic Engineering;1997-02

3. Basic Characteristics of Beam Position Drift and Field Stitching Error Caused by Electron Beam Column Charging;Japanese Journal of Applied Physics;1996-07-15

4. Characteristics of GaAs/AlGaAs HEMT's fabricated by X-ray lithography;IEEE Transactions on Electron Devices;1996

5. In search of high-performance resists for 50 kV shaped-beam exposure;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11

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