Capacity of electron beam reducing image projection systems with dynamically compensated field aberrations-Reference-Cited by-同舟云学术

Capacity of electron beam reducing image projection systems with dynamically compensated field aberrations

Published:1989-05 Issue:1-4 Volume:9 Page:217-220
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Koops Hans W.P.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Electron Beam Projection Techniques;Koops,1980

2. Korpuskularstrahloptisches Gerät zur Korpuskelbestrahlung eines Präparates in Form eines Flächenmusters mit mehreren untereinander gleichen Flächenelementen;Koops;Deutsches Patent DE 2460715,1974

3. Demagnifying Electron Projection with Grid Masks;Politycki;Siemens Forschungs und Entwicklungsberichte,1975

4. Demagnifying Electron Projection with Grid Masks;Politycki;Siemens Forschungs und Entwicklungsberichte,1978

5. Hochauflösende Elektronenlithograpie mit Hilfe der Mikroprojektion Teil 1: Auflösyng und Bildpunktzahl electronenoptischer Achromate;Lischke;Optik,1978

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