Swift heavy ion induced modification of the Co/Si interface; cobalt silicide formation-Reference-Cited by-同舟云学术

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Swift heavy ion induced modification of the Co/Si interface; cobalt silicide formation

Published:2002-09 Issue: Volume:158-159 Page:59-63
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Bhattacharya D,Srivastava S.K,Sahoo P.K,Principi G,Kabiraj D,Som T,Kulkarni V.N,Avasthi D.K

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference29 articles.

1. Metal–Semiconductor Interfaces;Hiraki,1995

2. Refractory silicides for integrated circuits

3. Ion-beam-induced silicidation and its use in very-large-scale integration processing

4. Swift heavy ion-induced modification of metallic thin films and multilayers

5. Swift heavy ion irradiation and annealing effects in Fe/Si multilayers

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3. Swift heavy ion assisted growth of silver nanoparticles embedded in hafnium oxide matrix;Journal of Applied Physics;2021-07-28

4. Self‐ion irradiation on hydrogenated amorphous carbon films at depth of adhesion interlayer: Radiation‐induced atomic intermixing and degraded film properties;Surface and Interface Analysis;2020-04-22

5. An assessment on crystallization phenomena of Si in Al/a-Si thin films via thermal annealing and ion irradiation;RSC Advances;2020

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