Self‐ion irradiation on hydrogenated amorphous carbon films at depth of adhesion interlayer: Radiation‐induced atomic intermixing and degraded film properties-Reference-Cited by-同舟云学术

Self‐ion irradiation on hydrogenated amorphous carbon films at depth of adhesion interlayer: Radiation‐induced atomic intermixing and degraded film properties

Published:2020-04-22 Issue:9 Volume:52 Page:553-568
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf Interface Anal

Author:

Xu Jiao¹²^ORCID,Qiao Li¹,Duan Zewen¹,Guo Dengji²,Chai Liqiang¹^ORCID,Zhao Xiaoyu¹,Wang Peng¹³^ORCID,Liu Weimin¹

Affiliation:

1. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical PhysicsChinese Academy of Sciences Lanzhou China

2. Institute of Semiconductor Manufacturing ResearchShenzhen University Shenzhen China

3. Center of Materials Science and Optoelectronics EngineeringUniversity of Chinese Academy of Science Beijing China

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sia.6785

Reference54 articles.

1. The effect of MeV ion irradiation on the hydrogen content and resistivity of direct ion beam deposited diamondlike carbon

2. Electrically conducting ion tracks in diamond-like carbon films for field emission

3. Conductivity of nanometer-sized ion tracks in diamond-like carbon films

4. Effects of high energy Au-ion irradiation on the microstructure of diamond films

5. Swift heavy ion effects on DLC-nanotube-diamond thin films

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