Plasma properties at the transition from remote to direct plasma
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference15 articles.
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2. Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation;Lucovsky;J. Vac. Sci. Technol. A,1987
3. Remote plasma-enhanced chemical vapour deposition with metal organic source gases: principles and applications;Kulisch;Surf. Coat. Technol.,1993
4. A. Sekiguchi. Induction heated plasma assisted chemical vapor deposition of SiN;Mito;J. Vac. Sci. Technol.,1986
5. Remote plasma enhanced CVD deposition of silicon nitride and oxide for gate insulators in (In, Ga)As FET devices;Richard;J. Vac. Sci. Technol. A,1985
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