Stable and unstable conditions of the sputtering mode by modulating at low frequency the current of a magnetron discharge
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference28 articles.
1. Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering
2. A physical model for eliminating instabilities in reactive sputtering
3. New results in d.c. reactive magnetron deposition of TiNx films
4. An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O2/Ar ratio, in Ti‐O2reactive sputtering processes
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