Modeling reactive magnetron sputtering: Opportunities and challenges
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference25 articles.
1. Review article: Tracing the recorded history of thin-film sputter deposition: from the 1800s to 2017;Greene;J. Vac. Sci. Technol. A,2017
2. A time-dependent model for reactive sputter deposition;Strijckmans;J. Phys. D. Appl. Phys.,2014
3. Modeling the reactive sputtering process, Thesis;Strijckmans,2015
4. The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation;Aeken;J. Phys. D. Appl. Phys.,2008
5. Magnetron sputter deposition as visualized by Monte Carlo modeling;Depla;Thin Solid Films,2012
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