Pulsed laser deposition and characterization of ZrO2Al2O3 films-Reference-Cited by-同舟云学术

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Pulsed laser deposition and characterization of ZrO2Al2O3 films

Published:1996-12 Issue: Volume:86-87 Page:149-152
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Qadri S.B.,Horwitz J.S.,Chrisey D.B.,Donovan E.P.,Skelton E.F.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference12 articles.

1. Phase stability ofZrO2−Al2O3thin films deposited by magnetron sputtering

2. e−‐beam deposition of tetragonal ZrO2 films stabilized with alumina and scandia

3. Growth of thin films by laser-induced evaporation

4. Microwave devices using YBa/sub 2/Cu/sub 3/O/sub 7- delta / films made by pulsed laser deposition

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Microstructural and mechanical properties of Al2O3/ZrO2 nanomultilayer thin films prepared by pulsed laser deposition;Applied Physics A;2018-01-22

2. Pulsed laser deposition of the yttria-stabilized zirconia films;Thin Solid Films;2008-11

3. Optical simulation, optimized design and fabrication of (ZrO2)x–(Al2O3)1−x composite films with thin inserted TiO2 layers for ArF-line high transmission attenuated phase shift mask blank applications;Applied Surface Science;2005-11

4. Composite thin films of (ZrO[sub 2])[sub x]-(Al[sub 2]O[sub 3])[sub 1−x] for high transmittance attenuated phase shifting mask in ArF optical lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004

5. Modification of zirconium oxide film microstructure during post-deposition annealing;Vacuum;2003-10

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