Optical simulation, optimized design and fabrication of (ZrO2)x–(Al2O3)1−x composite films with thin inserted TiO2 layers for ArF-line high transmission attenuated phase shift mask blank applications
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference8 articles.
1. Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I
2. Optical superlattices—a strategy for designing phase-shift masks for photolithography at 248 and 193 nm: Application to AlN/CrN
3. Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength
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