Composite thin films of (ZrO[sub 2])[sub x]-(Al[sub 2]O[sub 3])[sub 1−x] for high transmittance attenuated phase shifting mask in ArF optical lithography
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Published:2004
Issue:3
Volume:22
Page:1174
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:en
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
11 articles.
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