AFM study of SiNx:H surfaces treated by hydrogen plasma: modification of morphological and scaling characteristics
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference18 articles.
1. Selective Deposition and Bond Strain Relaxation in Silicon PECVD Using Time Modulated Silane Flow
2. Effect of hydrogen plasma precleaning on the removal of interfacial amorphous layer in the chemical vapor deposition of microcrystalline silicon films on silicon oxide surface
3. Effects of hydrogen surface pretreatment of silicon dioxide on the nucleation and surface roughness of polycrystalline silicon films prepared by rapid thermal chemical vapor deposition
4. Sulfurization of SiO2surface for polycrystalline silicon growth on SiO2/Si structure at 250 °C
5. In situ electron cyclotron resonance plasma surface cleaning of silicon
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