On the deposition mechanism of a-C:H films by plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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On the deposition mechanism of a-C:H films by plasma enhanced chemical vapor deposition

Published:2000-12 Issue:1 Volume:135 Page:27-33
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Cheng Y.H.,Wu Y.P.,Chen J.G.,Qiao X.L.,Xie C.S.,Tay B.K.,Lau S.P.,Shi X.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference32 articles.

1. Properties of diamond-like carbon

2. Engineering applications for diamond-like carbon

3. Diamond and diamondlike films: Deposition processes and properties

4. Plasma deposition of hydrogenated amorphous carbon (a-C:H) under a wide bias potential range

5. Influence of the substrate thickness and radio frequency on the deposition rate of amorphous hydrogenated carbon a-C:H films

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3. Hydrogenated amorphous carbon film deposited by plasma on recycled polypropylene as a functional barrier to hazardous migrants;Food Packaging and Shelf Life;2022-09

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5. Surface modification of 316L stainless steel by diamond-like carbon films;Journal of Iron and Steel Research International;2020-05-02

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