Plasma deposition of hydrogenated amorphous carbon (a-C:H) under a wide bias potential range
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference15 articles.
1. rf‐plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications
2. Amorphous hydrogenated carbon from the plasma deposition of C2H2, C2H4 or CH4
3. Deposition of hard carbon films by rf glow discharge method
4. Deposition of hard and insulating carbonaceous films on an r.f. target in a butane plasma
5. Characterization of diamondlike carbon films and their application as overcoats on thin‐film media for magnetic recording
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1. Hydrogenated Amorphous Carbon Films (a-C:H);Tetrahedrally Bonded Amorphous Carbon Films I;2018
2. Hydrogenated Amorphous Carbon Films;Advanced Structured Materials;2010
3. On the deposition mechanism of a-C:H films by plasma enhanced chemical vapor deposition;Surface and Coatings Technology;2000-12
4. Properties and structures of diamond-like carbon film deposited using He, Ne, Ar/methane mixture by plasma enhanced chemical vapor deposition;Journal of Applied Physics;2000-06
5. Experimental design and modelling in the investigation of process parameter effects on the tribological and mechanical properties of r.f.-plasma-deposited a-C:H films;Surface and Coatings Technology;1999-12
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