Author:
Yuan Renliang,Zhang Jiong,Zuo Jian-Min
Subject
Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference37 articles.
1. A 90 nm high volume manufacturing logic technology featuring novel 45 nm gate length strained silicon CMOS transistors;Ghani;IEDM,2003
2. A 90-nm logic technology featuring strained-silicon;Thompson;IEEE Trans. Electron Devices,2004
3. Electron Microscopy of Thin Crystals;Hirsch,1967
4. Quantitative measurement of displacement and strain fields from HREM micrographs;Hytch;Ultramicroscopy,1998
5. Theoretical discussions on the geometrical phase analysis;Rouviere;Ultramicroscopy,2005
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