The effect of pattern overlap on the accuracy of high resolution electron backscatter diffraction measurements-Reference-Cited by-同舟云学术

The effect of pattern overlap on the accuracy of high resolution electron backscatter diffraction measurements

Published:2015-08 Issue: Volume:155 Page:62-73
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Tong Vivian,Jiang Jun,Wilkinson Angus J.,Britton T. Ben

Funder

ESPRC

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference38 articles.

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3. Probing deformation and revealing microstructural mechanisms with cross-correlation-based, high-resolution electron backscatter diffraction;Britton;J. Manag.,2013

4. High resolution surface morphology measurements using EBSD cross-correlation techniques and AFM;Vaudin;Ultramicroscopy,2011

5. Precise measurement of strain accommodation in austenite matrix surrounding martensite in ferrous alloys by electron backscatter diffraction analysis;Miyamoto;Acta Mater.,2009

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