In situ observation of low temperature growth of crystalline silicon using reflection high-energy electron diffraction
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. Surface roughening during low temperature Si(100) epitaxy
2. Investigation of substrate-dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy
3. Reflection high-energy electron diffraction intensity oscillations during Si growth on Ge(001) by solid source/molecular beam epitaxy
4. Nucleation and Growth in Vicinity of Growing Surface in Making Microcrystalline Silicon
5. Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition
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