Investigation of substrate-dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy-Reference-Cited by-同舟云学术

Investigation of substrate-dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy

Published:1997-12-15 Issue:12 Volume:82 Page:6041-6046
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Smith L. L.,Srinivasan E.,Parsons G. N.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.366471

Reference21 articles.

1. In situ ellipsometry of thin-film deposition: Implications for amorphous and microcrystalline Si growth

2. Analysis of critical points in semiconductor optical functions from in situ and real-time spectroscopic ellipsometry

3. Influence of the substrate on the early stage of the growth of hydrogenated amorphous silicon evidenced by kinetic ellipsometry

4. Role of Hydrogen Plasma during Growth of Hydrogenated Microcrystalline Silicon: In Situ UV-Visible and Infrared Ellipsometry Study

5. In Situ Study of the Interfaces Between Plasma-Deposited Amorphous Silicon and Silicon Dioxide by UV-IR Spectroellipsometry

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5. Amorphous-crystalline phase transition during the growth of thin films: The case of microcrystalline silicon;Physical Review B;2001-08-01