Abatement of fluorinated compounds in thermal plasma flow

Author:

Chen Shiaw-Huei,Živný Oldřich,Mašláni AlanORCID,Chau Shiu-WuORCID

Funder

Czech Science Foundation (GA CR)

MOST

Publisher

Elsevier BV

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Environmental Chemistry,Biochemistry

Reference43 articles.

1. State-of-the-Technology Report. Technology Transfer #05104693A-ENG International SEMATECH Manufacturing Initiative;Reduction of Perfluorocompound (PFC) Emissions,2005

2. Abatement of PFCs from semiconductor manufacturing processes by nonthermal plasma technologies: a critical review;Chang;Ind. Eng. Chem. Res.,2006

3. Remote-plasma- enhanced reaction between a silicon surface and trifluoroacetylfluoride gas;Saito;J. Vac. Sci. Technol. A,2001

4. Effective PFC Gas Abatement in a Production Environment Semiconductor Fabtech-10th Ed;Seeley,2000

5. Etching Process Development of SiO2 Using Inductively Coupled Plasma. MSc. Thesis;Alam,2015

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