Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference40 articles.
1. K.F. Jensen, in: M.L. Hitchman, K.F. Jensen (Eds.), Chemical Vapor Deposition, Academic Press, San Diego, 1993, p. 62.
2. Chemical process of silicon epitaxial growth in a SiHCl3–H2 system
3. Numerical Evaluation of Silicon-Thin Film Growth from SiHCl3-H2Gas Mixture in a Horizontal Chemical Vapor Deposition Reactor
4. Modeling of Epitaxial Silicon Thin‐Film Growth on a Rotating Substrate in a Horizontal Single‐Wafer Reactor
5. H. Habuka, M. Katayama, M. Shimada, K. Okuyama, J. Jpn. Assoc. Crystal Growth 23 (1996) 2 (in Japanese).
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