Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide-Reference-Cited by-同舟云学术

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Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

Published:2001-09 Issue:1-2 Volume:231 Page:262-272
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Kukli Kaupo,Forsgren Katarina,Aarik Jaan,Uustare Teet,Aidla Aleks,Niskanen Antti,Ritala Mikko,Leskelä Markku,Hårsta Anders

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference50 articles.

1. Structure and stability of ultrathin zirconium oxide layers on Si(001)

2. Electrical properties of ZrO2 gate dielectric on SiGe

3. Waveguide Raman Spectroscopy Used for Structural Investigations of ZrO2Sol-Gel Waveguiding Layers

4. Chemistry of zirconia and its use in chromatography

5. Selective isopentane formation from CH3OH on a new one-atomic layer ZrO2/ZSM-5 hybrid catalyst

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2. High ionic conductivity of ultralow yttria concentration yttria-stabilized zirconia thin films;Journal of Vacuum Science & Technology A;2022-07

3. Order of magnitude enhancement of inherently selective atomic layer deposition of zirconia on silicon without deposition on copper: The role of precursor;Vacuum;2022-01

4. Mechanism for growth initiation on aminosilane-functionalized SiO2 during area-selective atomic layer deposition of ZrO2;Journal of Vacuum Science & Technology A;2021-05

5. Microstructure and mechanical properties of atomic layer deposited alumina doped zirconia;AIP Advances;2021-05-01

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