Computer modelling for ion-beam system design
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference20 articles.
1. First‐ and Second‐Order Magnetic Optics Matrix Equations for the Midplane of Uniform‐Field Wedge Magnets
2. Wafer charging and beam interactions in ion implantation
3. Theoretical and experimental study of space charge in intense ion beams
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Concepts and designs of ion implantation equipment for semiconductor processing;Review of Scientific Instruments;2006-11
2. Ion beams in silicon processing and characterization;Journal of Applied Physics;1997-05-15
3. The precision implant 9500 plasma flood system — the advanced solution to wafer charging;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-03
4. Considerations For Advanced Charging Solutions Applied to ULSI Device Fabrication;Ion Implantation Technology–92;1993
5. Design of a medium current beam line;Ion Implantation Technology–92;1993
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