On the mechanism of crystal growth orientation of ion beam assisted deposited thin films
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference24 articles.
1. Fundamentals of ion-beam-assisted deposition: Technique and film properties
2. Use of ion beam assisted deposition to modify the microstructure and properties of thin films
3. Ion bombardment during thin film deposition and its influence on mechanical and chemical surface properties
4. Variation of crystallization with arrival ratio in titanium nitride films formed by dynamic mixing method
5. Crystalline orientation control by the IVD method
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