Author:
Cherekdjian S.,Weisenberger W.
Subject
Instrumentation,Nuclear and High Energy Physics
Cited by
7 articles.
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1. Ion implantation for silicon device manufacturing: A vacuum perspective;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1996-05
2. Beam energy purity in the Eaton NV-8200P ion implanter;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-03
3. Review of secondary ion mass spectrometry characterization of contamination associated with ion implantation;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-07
4. Ion Beam Energy Purity in the Eaton NV-8200P Implanter;Ion Implantation Technology–92;1993
5. TOTAL PROCESS CONTROL FOR ION IMPLANTATION;Ion Implantation Technology–92;1993