Author:
Rathmell R.D.,Raatz J.E.,Becker B.L.,Kitchen R.L.,Luck T.R.,Decker J.H.
Subject
Instrumentation,Nuclear and High Energy Physics
Cited by
2 articles.
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1. DOSIMETRY DESIGN CONSIDERATIONS FOR SERIAL AND BATCH ION IMPLANTATION SYSTEMS;Ion Implantation Technology–92;1993
2. High throughput batch wafer handler for 100 to 200 mm wafers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-04