Optimal selection of sweep frequencies in ion implantation systems with X-Y scanning
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference3 articles.
1. Ion beams with application to ion implantation;Wilson,1973
2. Ion beam optical figuring;Kollsman Instrument Corp,1968
3. Internal report;Cecil,1976
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Simulation of spiral beam scanning for uniform irradiation on a large target;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1997-09
2. Computer simulation of deformed scanning wave effect on dose distribution in ion implantation;Ion Beam Modification of Materials;1996
3. Uniform target irradiation by circular beam sweeping;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1995-09
4. A new solid-state scan amplifier for medium-current ion implanters;Ion Implantation Technology–92;1993
5. Monitoring the micro-uniformity performance of a spinning disk implanter;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
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