Author:
Rathmell R.D.,Raatz I.E.,Becker B.L.,Kitchen R.L.,Luck T.R.,Decker J.H.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference9 articles.
1. Proc. 7th Int. Conf. on Ion Implantation Technology;Rathmell,1989
2. G.I. Robertson, U.S. Patent No. 3, 778, 626.
3. Target chambers for ion implantation using mechanical scanning