Ion beam induced wafer charging

Author:

Doherty B.J.,McCarron D.J.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Ion beams and their applications in high-resolution probe formation;IEEE Transactions on Plasma Science;2005-12

2. Microwave plasma source for high current ion beam neutralization;Review of Scientific Instruments;2000-02

3. Charging of substrates irradiated by particle beams;Applied Physics Letters;1997-12

4. Charging studies using the CHARM2 wafer surface charging monitor;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-04

5. Reliability issues concerning thin gate SiO2 and SiO2/Si interface for ULSI applications;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-04

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