Production high-energy ion implanters with milliampere beam capabilities-Reference-Cited by-同舟云学术

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Production high-energy ion implanters with milliampere beam capabilities

Published:1989-02 Issue: Volume:37-38 Page:591-595
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Boisseau P.,Dart A.,Denholm A.S.,Glavish H.F.,Libby B.,Simcox G.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference4 articles.

1. High energy ion implantation

2. Semiconductor International;Current,1985

3. Production high energy ion implanters using radio frequency acceleration

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Initial performance results from the NV1002 high energy ion implanter;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04

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