Author:
Liebert Reuel B.,Delforge Adrian,Hertel Richard,Lulsdorf Henry,Mears Eric,Satoh Shu
Subject
Instrumentation,Nuclear and High Energy Physics
Reference6 articles.
1. these Proceedings 7th Int. Conf. on Ion Implantation Technology;Satoh,1989
2. Single‐ring magnetic cusp ion source
3. these Proceedings 7th Int. Conf. on Ion Implantation Technology;Hertel,1989
4. these Proceedings 7th Int. Conf. on Ion Implantation Technology;Liebert,1989
5. Applications of Magnetic Scanning to High Current Implantation
Cited by
6 articles.
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1. Process Control Issues in the Varian E1000 High Current Implanter;Ion Implantation Technology–92;1993
2. Control of wafer charging on the Varian EXTRION 1000 ion implanter;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
3. Control of metal contamination in the Varian Extrion 1000 ion implantation system;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
4. Ion beam system for the new high current ion implantation system Extrion-1000;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-02
5. Dose control system for the Extrion 1000 ion implantation system;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-02