Ion source with plasma cathode for ion assisted deposition-Reference-Cited by-同舟云学术

Ion source with plasma cathode for ion assisted deposition

Published:1989-02 Issue: Volume:37-38 Page:166-168
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Shiono T.,Shibuya T.,Harano Y.,Yabe E.,Takayama K.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference15 articles.

1. Ion beam processing for coating MgF_2 onto ambient temperature substrates

2. Ion‐assisted deposition of bulklike ZrO2films

3. Protective dielectric coatings produced by ion-assisted deposition

4. Ion-assisted deposition of optical thin films: low energy vs high energy bombardment

5. Ion-beam-assisted deposition of thin films

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1. Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-11

2. Ion sources for ion beam assisted thin‐film depositiona);Review of Scientific Instruments;1992-11

3. An ECR microwave plasma cathode for ion sources with electrostatic reflex containment;Review of Scientific Instruments;1992-04

4. Plasma cathode oxygen‐ion source;Review of Scientific Instruments;1991-12

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