Author:
Tohru Hara ,Takeshi Muraki ,Masataka Sakurai ,Satoru Takeda ,Morio Inoue,Shinji Fuji
Subject
Instrumentation,Nuclear and High Energy Physics
Cited by
2 articles.
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1. Monte Carlo simulation of silicon amorphization during ion implantation;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;1998-12
2. Shallow junction formation in Si-devices: Damage accumulation and the role of photo-acoustic probes and multi-species implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-01