Thin buried oxide in implanted silicon-Reference-Cited by-同舟云学术

Thin buried oxide in implanted silicon

Published:1993-01 Issue: Volume:80-81 Page:813-817
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Meda L.,Bertoni S.,Cerofolini G.F.,Spaggiari C.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference11 articles.

1. Semiconductor Silicon 90;Celler,1990

2. Chemistry for Innovative Materials;Cerofolini,1991

4. IBIS, private communication (1991).

5. SOI Technology and Devices;Meda,1992

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