A high current sheet plasma ion source
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference7 articles.
1. Proc. 11th Symp. on ISIAT '87;Matsuda,1987
2. A 26‐cm electron‐cyclotron‐resonance ion source for reactive ion beam etching of SiO2 and Si
3. Microwave ion source for high‐current implanter
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1. Production of sheet plasma using a TP-D plasma source;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-04
2. Development of a high energy large sheet ion beam system and a low energy ion beam deposition system;Laser and Ion Beam Modification of Materials;1994
3. PRODUCTION OF RF SLAB PLASMA USING RECTANGULAR MAGNETIC LINE CUSP FIELD;Ion Implantation Technology–92;1993
4. A Compact Sheet Ion Source for Metal Ion Beam;Ion Implantation Technology–92;1993
5. Ion sources for ion beam assisted thin‐film depositiona);Review of Scientific Instruments;1992-11
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