Author:
TAKAHASHI K.,HASHIMOTO S.,YABE E.,TAKAYAMA K.,YAMAUCHI K.
Reference7 articles.
1. S. Matsuda and M. Akiba, Proc. 11th Symp. on ISIAT1987 Tokyo (1987) 95.
2. A 26‐cm electron‐cyclotron‐resonance ion source for reactive ion beam etching of SiO2 and Si
3. Microwave ion source for high‐current implanter
4. K. Sunako and K. Takayama, Proc. 17th Int. Conf. Phenomena in Ionized Gases, Budapest, 2 (1985) 753.
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