Author:
Woodard Ollie,Lindsey Paul,Cecil Joseph,Pipe Robert
Subject
Instrumentation,Nuclear and High Energy Physics
Reference1 articles.
1. these Proceedings (Ion Implantation Equip. & Tech. '84;Scaife,1985
Cited by
5 articles.
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1. Control of surface charging during high current ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-02
2. Ion Implantation for VLSI;VLSI Electronics Microstructure Science;1989
3. On-line measurement of the spatial dose uniformity in ion implantation processes;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1988-06
4. The Veeco 4840 automated implant system;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1987-01
5. Current status of ion implantation equipment and techniques for semiconductor IC fabrication;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1985-01