Current status of ion implantation equipment and techniques for semiconductor IC fabrication-Reference-Cited by-同舟云学术

Current status of ion implantation equipment and techniques for semiconductor IC fabrication

Published:1985-01 Issue:1-2 Volume:6 Page:9-15
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Current Michael I.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference38 articles.

1. D. Hutcheson, VLSI Research, San Jose, CA.

2. these Proceedings (Ion Implantation Equip. & Tech. '84);Ziegler,1985

3. presentation T-9, 5th Int. Conf. on Ion Implantation Equipment and Techniques;Purser,1984

4. these Proceedings (Ion Implantation Equip. & Tech. '84);Rathmell,1985

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