Studies of temperature and flux dependences of sputtering yield of nickel from two-layered films of Ni-Ni3C
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference19 articles.
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1. Depth of origin of sputtered atoms (Technical Report);Pure and Applied Chemistry;1993-01-01
2. Enhanced sputtering of one species in the processing of multielement thin films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1992-07
3. Temperature and substrate dependence of Ar sputtering of CoSi2thin films;Journal of Applied Physics;1992-05
4. Highly selective sputtering of silicon from TiSi2at elevated temperature;Applied Physics Letters;1992-03-09
5. Metal Sputtering and Hydrogen Retention in Metal-Carbon Composite Layer Materials;Fusion Technology;1991-07
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