Application of a MeV nickel ion beam for PIXE analysis of iron near the surface of a silicon wafer-Reference-Cited by-同舟云学术

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Application of a MeV nickel ion beam for PIXE analysis of iron near the surface of a silicon wafer

Published:1995-05 Issue:1 Volume:100 Page:122-124
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Horino Y.,Mokuno Y.,Kinomura A.,Chayahara A.,Fujii K.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference11 articles.

1. Analytical application of particle induced X-ray emission

2. Inner-Shell Vacancy Production in Ion-Atom Collisions

3. Ar ion induced X-ray emission for the analysis of light elements in CdTe

4. Evaluation of surface analysis methods for characterization of trace metal surface contaminants found in silicon integrated circuit manufacturing

5. A Monte Carlo computer program for the transport of energetic ions in amorphous targets

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Trace Analysis by Heavy Ion Induced X-Ray Emission;Microchimica Acta;2000-06-19

2. Energy straggling induced errors in heavy-ion PIXE analysis;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1998-03

3. X-ray Spectrometry;Analytical Chemistry;1996-01-01

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