Properties of epitaxial silicon layers on buried silicon nitride produced by ion implantation
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference28 articles.
1. MRS Fall Meeting;Tsaur,1985
2. W Skorupa, K Wollschläger, U Kreissig, R Grötzschel and H Bartsch, Proc 5th Int Conf on Ion Beam Modification of Materials, Catania (Italy) June 1986 June 1986; Nucl Instrum Meth Phys Res, Section B (in press).
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