Progress in solids analysis by sputtered neutral mass spectrometry
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference37 articles.
1. Quantitative depth profile and bulk analysis with high dynamic range by electron gas sputtered neutral mass spectrometry
2. Relative elemental sensitivity factors in secondary neutral mass spectrometry
3. Angular distribution of particles sputtered from metals and alloys
4. Plasma studies on the Leybold–Heraeus INA3 secondary neutral mass spectrometry system
5. High‐sensitivity plasma‐based sputtered neutral mass spectrometry depth profiling of zinc‐implanted GaAs
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1. Depth profiling with SNMS and SIMS of Zn(O,S) buffer layers for Cu(In,Ga)Se2 thin-film solar cells;Surface and Interface Analysis;2013-09-30
2. Characterization of Compound Semiconductor Material by Ion Beams;Handbook of Compound Semiconductors;1995
3. Depth-profiles within glass samples from anodic bonding experiments with copper using SNMS;Fresenius' Journal of Analytical Chemistry;1993
4. Quantitative analysis of oxide films on ODS-alloys using MCs+-SIMS and e-beam SNMS;Fresenius' Journal of Analytical Chemistry;1993
5. Atomic Spectrometry Update—Clinical and Biological Materials, Foods and Beverages;J. Anal. At. Spectrom.;1992
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