A review of reactive ion beam etching for production-Reference-Cited by-同舟云学术

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A review of reactive ion beam etching for production

Published:1984-03 Issue:3-4 Volume:34 Page:455-462
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Revell P.J.,Goldspink G.F.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference78 articles.

1. Proc Semiconductor International;Jolly,1982

2. Electronic Compenents;Holland,1972

3. J Franks, UK Patent 30249/74 (1974).

4. Ion milling (ion beam etching), 1975–1978: A bibliography

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