Macrocrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference20 articles.
1. Microstructure and properties of rf‐sputtered amorphous hydrogenated silicon films
2. Control of Si-H bonds in μc-Si:H prepared by hydrogen plasma sputtering
3. Polycrystalline silicon films deposited in a glow discharge at temperatures below 250 °C
4. Structure Change of Microcrystalline Silicon Films in Deposition Process
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