Low energy electron microscopy of surface processes-Reference-Cited by-同舟云学术

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Low energy electron microscopy of surface processes

Published:1990-01 Issue:1-3 Volume:41 Page:5-10
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Bauer E,Mundschau M,Swiech W,Telieps W

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference22 articles.

1. Study of Surfaces and Interfaces by Electron Optical Techniques;Bauer,1988

2. Surface studies by low-energy electron microscopy (LEEM) and conventional UV photoemission electron microscopy (PEEM)

3. Evaluation of Advanced Semiconductor Materials by Electron Microscopy;Bauer,1990

4. The Si(111) 7 × 7 TO “1 × 1” transition

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. LEEM, SPLEEM and SPELEEM;Springer Handbook of Microscopy;2019

2. Applications in Surface Science;Surface Microscopy with Low Energy Electrons;2014

3. Cathode lens electron microscopy: past and future;Journal of Physics: Condensed Matter;2009-07-07

4. Fundamental processes in Si/Si and Ge/Si epitaxy studied by scanning tunneling microscopy during growth;Surface Science Reports;2001-09

5. SEM imaging of fundamental growth processes during MBE of GaAs on (111)A substrates;Journal of Crystal Growth;1999-05

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