New octahedral Ta(V) hydrazido-substituted compounds for atomic layer deposition: Syntheses, X-ray diffraction structures of TaCl(NMe2)3[N(TMS)NMe2] and Ta(NMe2)4[N(TMS)NMe2], and fluxional behavior of the amido and hydrazido ligands in solution-Reference-Cited by-同舟云学术

New octahedral Ta(V) hydrazido-substituted compounds for atomic layer deposition: Syntheses, X-ray diffraction structures of TaCl(NMe2)3[N(TMS)NMe2] and Ta(NMe2)4[N(TMS)NMe2], and fluxional behavior of the amido and hydrazido ligands in solution

Published:2010-05 Issue:7 Volume:29 Page:1754-1759
ISSN:0277-5387
Container-title:Polyhedron
language:en
Short-container-title:Polyhedron

Author:

Huang Shih-Huang,Pilvi Tero,Wang Xiaoping,Leskelä Markku,Richmond Michael G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Physical and Theoretical Chemistry

Reference41 articles.

1. High-κ gate dielectrics: Current status and materials properties considerations

2. Atomic layer deposition (ALD): from precursors to thin film structures

3. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

4. The Atomic Layer Deposition of HfO2and ZrO2using Advanced Metallocene Precursors and H2O as the Oxygen Source

5. Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors

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